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Wo3 Sputtered Thin-Films For Nox Monitoring

SBERVEGLIERI, Giorgio;DEPERO, Laura Eleonora;
1995-01-01
1995
Nessuno
PE3_5 Electronic properties of materials and transport
SENSORS AND ACTUATORS. B, CHEMICAL
sì
2-s2.0-0029306414
WOS:A1995QW08300019
Sì, ma tipo non specificato
Inglese
Internazionale
26
89
92
3
We present in this paper preliminary results concerning the preparation of tungsten trioxide thin films by reactive sputtering, the characterization either of their structural properties by means of XRD measurements or of the film morphology with the AFM microscope and the electrical response of the films towards toxic and pollutant gases. WO3 thin films showed a good sensitivity towards low NOx concentrations (1-10 ppm) in the temperature interval 200-500 degrees C and they were also sensitive to 10 ppm NH3. These films were also selective to NOx with respect to interfering gases like CH4, CO and SO2 in the same temperature range.
4
info:eu-repo/semantics/article
262
Sberveglieri, Giorgio; Depero, Laura Eleonora; S., Groppelli; P., Nelli
1 Contributo su Rivista::1.1 Articolo in rivista
none
1.1 Articolo in rivista
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11379/34159
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