Kinetics of disorder-order transition of Ti-W oxide thin-film sensors

DEPERO, Laura Eleonora;SBERVEGLIERI, Giorgio
1996-01-01

1996
Nessuno
PE3_5 Electronic properties of materials and transport
Sì, ma tipo non specificato
Inglese
Internazionale
31
19
24
5
The kinetics of structural changes of Ti-W oxide thin films has been studied by X-ray diffraction and Raman spectroscopy. The XRD patterns were measured after each annealing treatment. As the number of annealing treatments increased, a progressive ordering of the as-grown amorphous film was observed by XRD and confirmed by Raman measurements. An explanation of the ordering is given in terms of segregation of Ti impurities at the surface.
5
info:eu-repo/semantics/article
262
Depero, Laura Eleonora; I. N., Sora; C., Perego; L., Sangaletti; Sberveglieri, Giorgio
1 Contributo su Rivista::1.1 Articolo in rivista
none
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11379/34146
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