Different Zn-Ti-O phases were prepared with high reproducibility in the form of very thin films (thickness: 40 nm) by alternating atomic layer deposition cycles of TiO(2) and ZnO precursors at 90 degrees C, followed by annealing at 600 degrees C. This procedure enables a very fine control of stoichiometry and the achievement of unexpected zinc titanate phases.
Tailoring phase and composition at the nanoscale: Atomic layer deposition of Zn-Ti-O thin films
BORGESE, Laura;BONTEMPI, Elza;DEPERO, Laura Eleonora;COLOMBI, Paolo;ALESSANDRI, Ivano
2011-01-01
Abstract
Different Zn-Ti-O phases were prepared with high reproducibility in the form of very thin films (thickness: 40 nm) by alternating atomic layer deposition cycles of TiO(2) and ZnO precursors at 90 degrees C, followed by annealing at 600 degrees C. This procedure enables a very fine control of stoichiometry and the achievement of unexpected zinc titanate phases.File in questo prodotto:
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