Integrated nonlinear metasurfaces leading to high-efficiency optical second harmonic generation (SHG) are highly desirable for optical sensing, imaging, and quantum photonic systems. Compared to traditional metal-only metasurfaces, their hybrid counterparts, where a noncentrosymmetric nonlinear photonic material is incorporated in the near-field of a metasurface, can significantly boost SHG efficiency. However, it is difficult to integrate such devices on-chip due to material incompatibilities, thickness scaling challenges, and the narrow band gaps of nonlinear optical materials. Here, we demonstrate significantly enhanced SHG in on-chip integrated metasurfaces by using nanometer thin films of ferroelectric Y:HfO2. This material has the merit of CMOS compatibility, ultraviolet transparency up to 250 nm, and significant scalability down to sub-10 nm when deposited on silicon. We observe a 20-fold magnitude enhancement of the SHG intensity from the hybrid metasurface compared to a bare ferroelectric HfO2 thin film. Moreover, a 3-fold SHG enhancement is observed from the hybrid metasurface compared to a control structure using nonferroelectric HfO2, demonstrating a major contribution to the SHG signal from ferroelectric Y:HfO2. The effective second-order nonlinear optical coefficient χ(2) of Y:HfO2 is determined to be 6.0 ± 0.5 pm/V, which is comparable to other complex nonlinear photonic oxide materials. Our work provides a general pathway to build an efficient on-chip nanophotonic nonlinear light source for SHG using ferroelectric HfO2 thin films.

Enhanced second harmonic generation from ferroelectric HfO2-based hybrid metasurfaces

Modotto, Daniele;
2019-01-01

Abstract

Integrated nonlinear metasurfaces leading to high-efficiency optical second harmonic generation (SHG) are highly desirable for optical sensing, imaging, and quantum photonic systems. Compared to traditional metal-only metasurfaces, their hybrid counterparts, where a noncentrosymmetric nonlinear photonic material is incorporated in the near-field of a metasurface, can significantly boost SHG efficiency. However, it is difficult to integrate such devices on-chip due to material incompatibilities, thickness scaling challenges, and the narrow band gaps of nonlinear optical materials. Here, we demonstrate significantly enhanced SHG in on-chip integrated metasurfaces by using nanometer thin films of ferroelectric Y:HfO2. This material has the merit of CMOS compatibility, ultraviolet transparency up to 250 nm, and significant scalability down to sub-10 nm when deposited on silicon. We observe a 20-fold magnitude enhancement of the SHG intensity from the hybrid metasurface compared to a bare ferroelectric HfO2 thin film. Moreover, a 3-fold SHG enhancement is observed from the hybrid metasurface compared to a control structure using nonferroelectric HfO2, demonstrating a major contribution to the SHG signal from ferroelectric Y:HfO2. The effective second-order nonlinear optical coefficient χ(2) of Y:HfO2 is determined to be 6.0 ± 0.5 pm/V, which is comparable to other complex nonlinear photonic oxide materials. Our work provides a general pathway to build an efficient on-chip nanophotonic nonlinear light source for SHG using ferroelectric HfO2 thin films.
File in questo prodotto:
File Dimensione Formato  
acsnano19.pdf

solo utenti autorizzati

Descrizione: Full text
Tipologia: Full Text
Licenza: NON PUBBLICO - Accesso privato/ristretto
Dimensione 4.15 MB
Formato Adobe PDF
4.15 MB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11379/514316
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? 3
  • Scopus 41
  • ???jsp.display-item.citation.isi??? 41
social impact