Arsenic is a widespread contaminant in the environment around the world. The most abundant species of arsenic in groundwater are arsenite [As(III)] and arsenate [As(V)]. Several arsenic removal processes can reach good removal yields only if arsenic is present as As(V). For this reason it is often necessary to proceed with a preliminary oxidation of As(III) to As(V) prior to the removal technology. Several studies have focused on arsenic oxidation with conventional reagents and advanced oxidation processes. In the present study the arsenic oxidation was evaluated using hydrogen peroxide, UV radiation and their combination in distilled and in real groundwater samples. Hydrogen peroxide and UV radiation alone are not effective at the arsenic oxidation. Good arsenic oxidation yields can be reached in presence of hydrogen peroxide combined with a high UV radiation dose (2,000 mJ/cm2). The quantum efficiencies for As(III) oxidation were calculated for both the UV photolysis and the UV/H2O2 processes.

Arsenic oxidation by UV radiation combined with hydrogen peroxide

SORLINI, Sabrina;GIALDINI, Francesca;
2010-01-01

Abstract

Arsenic is a widespread contaminant in the environment around the world. The most abundant species of arsenic in groundwater are arsenite [As(III)] and arsenate [As(V)]. Several arsenic removal processes can reach good removal yields only if arsenic is present as As(V). For this reason it is often necessary to proceed with a preliminary oxidation of As(III) to As(V) prior to the removal technology. Several studies have focused on arsenic oxidation with conventional reagents and advanced oxidation processes. In the present study the arsenic oxidation was evaluated using hydrogen peroxide, UV radiation and their combination in distilled and in real groundwater samples. Hydrogen peroxide and UV radiation alone are not effective at the arsenic oxidation. Good arsenic oxidation yields can be reached in presence of hydrogen peroxide combined with a high UV radiation dose (2,000 mJ/cm2). The quantum efficiencies for As(III) oxidation were calculated for both the UV photolysis and the UV/H2O2 processes.
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11379/37329
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