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Effects of oxygen stoichiometry on the structural properties of W-Ti-O thin films

DEPERO, Laura Eleonora;SBERVEGLIERI, Giorgio
1998-01-01
1998
Nessuno
Materials Science Forum
PE3_5 Electronic properties of materials and transport
WOS:000074945400071
2-s2.0-14044265194
Sì, ma tipo non specificato
Inglese
Internazionale
278-2
472
477
5
X-ray diffraction and microraman studies have been carried out on W-Ti-O thin films deposited by RF sputtering onto Al2O3 substrates. Several samples have been prepared with different O-2 partial pressures during the reactive sputtering deposition. The interpretation of experimental data and modeling studies allowed us to ascribe the structures observed in the XRD pattern to an effect of translational disorder generated by oriented defects in Magneli-like phases. These results are supported by those of of microraman analysis, which allowed us to point out the effect of Ti addition on the vibrational properties of WO3. The results are interpreted in terms of the tendency of Ti to form edge-sharing Ti-O octahedral units, and therefore structural defects, in the WO3 lattice.
2 Contributo in Volume::2.1 Contributo in volume (Capitolo o Saggio)
5
268
none
L., Sangaletti; Depero, Laura Eleonora; B., Allieri; S., Groppelli; Sberveglieri, Giorgio
info:eu-repo/semantics/bookPart
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11379/34122
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